Doplyth – Photolithographic Spin-On-Dopants

Doplyth represents our flagship line of photolithographic spin-on-dopants. Engineered to integrate seamlessly with your lithographic infrastructure, Doplyth delivers exceptional precision and uniformity in dopant placement. Doplyth is the path to single step semiconductor fabrication.

 

Whether you need n-type (phosphorus-based) or p-type (boron-based) doping, our formulations offer robust performance with simplified processing.

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Product Variants:

• UV Dopants (365 nm Exposure):

  • N-Type: Optimized for phosphorus diffusion with high resolution and uniformity.

  • P-Type: Formulated with boron chemistry to precisely define p-type regions.

• DUV Dopants (248 nm Exposure):

  • N-Type: Designed for deep-UV lithography, featuring faster curing and higher crosslink density for robust dopant profiles.

  • P-Type: Tailored for DUV processing to ensure excellent pattern fidelity and uniform doping.

 

Key Benefits:

• Integrated photolithographic patterning and doping

• Sub-micron resolution and superior dopant uniformity

• Lower thermal budgets and streamlined process flows

• Compatibility with existing lithography equipment